SEMICON China 2025 Concludes Successfully: Nanjing Yuanlei Nanomaterials Showcases Innovation Strength of Domestic Semiconductor Equipment
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- Time of issue:2025-03-29
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(Summary description)The global semiconductor industry event SEMICON China 2025 was successfully held from March 26 to 28 at the Shanghai New International Expo Center. This year's exhibition brought together top global experts, industry leaders, and innovative enterprises to explore the latest trends in semiconductor technology. As an outstanding representative in the field of domestic semiconductor equipment, Nanjing Yuanlei Nanomaterials Co., Ltd. (hereinafter referred to as "Yuanlei Nano") showcased its leading atomic layer deposition (ALD) and silicon-germanium (SiGe) epitaxy equipment, demonstrating China's groundbreaking achievements in high-end semiconductor deposition equipment, processes, and integrated material solutions.
SEMICON China 2025 Concludes Successfully: Nanjing Yuanlei Nanomaterials Showcases Innovation Strength of Domestic Semiconductor Equipment
(Summary description)The global semiconductor industry event SEMICON China 2025 was successfully held from March 26 to 28 at the Shanghai New International Expo Center. This year's exhibition brought together top global experts, industry leaders, and innovative enterprises to explore the latest trends in semiconductor technology. As an outstanding representative in the field of domestic semiconductor equipment, Nanjing Yuanlei Nanomaterials Co., Ltd. (hereinafter referred to as "Yuanlei Nano") showcased its leading atomic layer deposition (ALD) and silicon-germanium (SiGe) epitaxy equipment, demonstrating China's groundbreaking achievements in high-end semiconductor deposition equipment, processes, and integrated material solutions.
- Categories:Company News
- Author:
- Origin:
- Time of issue:2025-03-29
- Views:0
The global semiconductor industry event SEMICON China 2025 was successfully held from March 26 to 28 at the Shanghai New International Expo Center. This year's exhibition brought together top global experts, industry leaders, and innovative enterprises to explore the latest trends in semiconductor technology. As an outstanding representative in the field of domestic semiconductor equipment, Nanjing Yuanlei Nanomaterials Co., Ltd. (hereinafter referred to as "Yuanlei Nano") showcased its leading atomic layer deposition (ALD) and silicon-germanium (SiGe) epitaxy equipment, demonstrating China's groundbreaking achievements in high-end semiconductor deposition equipment, processes, and integrated material solutions.
Focus on Innovation: Yuanlei Nano Leads New Breakthroughs in Domestic Semiconductor Equipment
At the exhibition, Yuanlei Nano highlighted its independently developed ALD and SiGe epitaxy equipment, attracting significant attention from domestic and international industry experts and clients. With advanced deposition technology, stable equipment performance, and comprehensive solutions, the company demonstrated the competitiveness of domestic semiconductor equipment in high-end manufacturing.
ALD and SiGe epitaxy technologies are critical processes in semiconductor manufacturing, playing a vital role in enhancing chip performance. Through continuous technological innovation, Yuanlei Nano has achieved breakthroughs in uniformity, density, and production capacity for advanced deposition equipment, which can be widely applied in sub-28nm logic chips, memory devices, advanced packaging, and other fields.
Promoting Domestic Substitution and Supporting a Self-Reliant Semiconductor Supply Chain
Amid profound changes in the global semiconductor industry, supply chain security and technological innovation have become key industry focuses. Yuanlei Nano is committed to providing high-performance, high-reliability semiconductor equipment and integrated solutions for global clients, supporting the localization of the supply chain. During the exhibition, the company reached cooperation intentions with several internationally renowned semiconductor enterprises and research institutions, further expanding its global market presence.
Mr. Zheng Jin, General Manager of Yuanlei Nano, stated, "SEMICON China is an important platform to showcase the strength of China's semiconductor industry. We aim to demonstrate the reliability and innovation of domestic high-end semiconductor equipment to global clients through this event. In the future, we will continue to increase R&D investment, promote the localization of critical equipment and core components, and contribute to the global semiconductor industry."
SEMI China President Ju Long Visits Yuanlei Nano’s Booth
During SEMICON China 2025. Mr. Ju Long, President of SEMI China, visited Yuanlei Nano’s booth to gain an in-depth understanding of the company’s latest breakthroughs in key semiconductor equipment and materials. President Ju carefully reviewed Yuanlei Nano’s core products in 2.5D/3D advanced packaging, compound semiconductors, and advanced logic/memory process technologies, and personally observed a live demonstration of high-precision ALD equipment. He highly praised Yuanlei Nano’s achievements in localization, technological innovation, and green manufacturing, remarking, "Yuanlei Nano has demonstrated the core strength of domestic semiconductor equipment, making outstanding contributions to the self-reliance and controllability of China's semiconductor supply chain."
SEMICON China 2025 has concluded successfully, but innovation never stops. Yuanlei Nano will continue to deepen its efforts in semiconductor equipment manufacturing and R&D,
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