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Al2O3 Thermal_ALD
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Al2O3 Thermal_ALD

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Detailed description

Substrate size

4 inches, 6 inches, 8 inches

Film type  

Al2O3

Process types

Thermal_ALD

Temperature range

Both high and low temperatures are possible (please leave a message for detailed requirements)

density

Passed KHF erosion experiment with excellent result

The surface roughness is 25 nm Ra

0.21

1-σ(%)

<2

GPC/(A°)

0.94 

We could not find any corresponding parameters, please add them to the properties table
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