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Al2O3 Thermal_ALD
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Number of views:
1000
Product serial number
Category
Craft show
Quantity
-
+
Stock:
0
1
Detailed description
|
Substrate size |
4 inches, 6 inches, 8 inches |
|
Film type |
Al2O3 |
|
Process types |
Thermal_ALD |
|
Temperature range |
Both high and low temperatures are possible (please leave a message for detailed requirements) |
|
density |
Passed KHF erosion experiment with excellent result |
|
The surface roughness is 25 nm Ra |
0.21 |
|
1-σ（%） |
<2 |
|
GPC/(A°) |
0.94 |
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