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PC 10 Series

PC 10 is a cluster-type ALD equipment developed by ANAME, aiming for mass production customers in IC and compound semiconductor field. It consists of a self-developed VTM system and 8-10 process chambers, with each being able to effectively control oxygen content in nitride films through the use of high-speed turbo-molecular pumps. In addition, the system is equipped with 2 cooling stations with a wafer cooling capacity of 10 pieces each. It also has 2 loadlocks that can hold 25 pieces of wafer each. The uniquely designed process chamber and plasma treatment technology not only guarantees a good thermal and flow field, but also significantly reduces damage to local films. The system is easy to maintain. The integrated weight lifting system greatly reduces the time required for assembly, checkups and maintenance.
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Specifications

Technical parameters       

●     Wafer size: 6/8 inches

●    Loading capacity: single wafer/chamber, 8-10 chamber configurable

●    Compatible processes: AlN, Al2O3, TiN and etc.

●    Application field: compound semiconductor, MEMS and etc.

 

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