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PC10 ALD configured with Aname’s Flura
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PC10 ALD configured with Aname’s Flura

platform is developed for customers running mass production in 8” and below of compound semiconductor fields. It is an integrated system with up to 10 process chambers, vacuum transfer chamber, 2 cooling stations and 2 loadloacks.
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Product Description

PC10’s wafer transfer system and process chambers effectively control oxygen content in nitride films using high speed turbo-molecular pumps. The uniquely designed process chamber and plasma treatment technology not only guarantees temperature and gas flow uniformity, but also reduces localized film damage due high-energy ions. An integrated weight lifting system also greatly reduces the time of system assembly, troubleshooting, repair and maintenance. The platform can be equipped with 8 PE-ALD chambers and 2 BAT25 TH-ALD chambers, currently one of the highest throughput equipment that exist for 8” compound semiconductor production.

Highlights:
•Step coverage：＞95%   
•Particle：<10 @ 0.2μm
•Uniformity：<1% @ 8inch EE 10mm
•Maximum capacity：50 pcs 8 inch wafer
•Throughput：> 28WPH (@10nm AlN 8pc)
•Number of process chambers：Max 10 (PE)
•Process：compound semiconductor, MEMS
•Material：AlN, Al2O3, TiN

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Telephone: +025-58277112
Sales Telephone: Manager Hu 13916235350
                            Manager Zhang 13815424556
13815424556Manager Zhang (North China, Northwest China, Northeast China)
Overseas Business Department Tel: Manager 17721046096 Wang
After-sales service telephone: Manager 15850767261 Ni
Address: 22nd and 25th floors, Building B, Qingyun Building, No. 266, Puyun Road, Jiangbei New District, Nanjing

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