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ALD/ALE Elegant II-Y

Elegant II-Y series, with a modulated system and dual-hot chamber design, is Aname’s second generation ALD equipment. It mainly targets universities, research institutes and mini batch production customers.
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Product Description

The equipment comes with a modular system, automated transfer system and user-friendly UI operating system. Process temperature range from RT to 500oC. Upgradable components include ICP Plasma/Microwave, Ozone generator, turbo pump, up to 6 independent precursor lines, precursor heating (RT to 300oC) and higher temperature modules, etc. Wafer size is up to 12”, downward compatible. Simultaneous processing of Thermal, Plasma and Ozone ALD process can be realized in the same chamber.

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ALD/ALE ElegantⅡ
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Telephone: +025-58277112
Sales Telephone: Manager Hu 13916235350
                            Manager Zhang 13815424556
13815424556Manager Zhang (North China, Northwest China, Northeast China)
Overseas Business Department Tel: Manager 17721046096 Wang
After-sales service telephone: Manager 15850767261 Ni
Address: 22nd and 25th floors, Building B, Qingyun Building, No. 266, Puyun Road, Jiangbei New District, Nanjing

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