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BAT 300 Series

BAT 300 is the first mass production ALD equipment designed by Aname. This series can simultaneously deposit on 300 pieces 4” wafers or 200 pieces 6” wafers, which greatly increases throughput and reduces running cost.
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BAT 300 R2R has a dual-hot chamber design to ensure efficient precursor utilization. Our proprietary gas inlet design and heating method ensure highly uniform film deposition. The equipment uses a unique chamber structure that avoid cross contamination and make performing maintenance easy. The detachable carrier that is compatible with standard 4/6” transfer cassettes simplifies the loading/unloading process and makes it easier to upgrade to large-size wafers in the future. This product can meet the throughput requirements of photoelectric display industry. 

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Telephone: +025-58277112
Sales Telephone: Manager Pan 15655060066
                            Manager Zhang 13815424556
13815424556Manager Zhang (North China, Northwest China, Northeast China)
Overseas Business Department Tel: Manager 17721046096 Wang
After-sales service telephone: Manager 15850767261 Ni
Address: 22nd and 25th floors, Building B, Qingyun Building, No. 266, Puyun Road, Jiangbei New District, Nanjing

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