GRACE Mx Series
Customizable compartment sizes of 200X400mm2, 300X300 mm2, 600X600 mm2. It can accommodate wafer substrate as well as odd-size substrate. Process temperature range from RT to 300℃. Upgradable components include up to 6 independent precursor lines, precursor heating (RT to 200oC) and higher temperature modules, etc. It can process a wide range of oxide materials eg. SiO2, SnO2, HfO2, Al2O3and metal materials eg. Cu, Ru, etc. Applications include perovskite and advance packaging, etc.
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Sales Telephone: Manager Hu 13916235350
Manager Zhang 13815424556
13815424556Manager Zhang (North China, Northwest China, Northeast China)
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Address: 22nd and 25th floors, Building B, Qingyun Building, No. 266, Puyun Road, Jiangbei New District, Nanjing
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