
On the morning of December 23, 2025, the launch ceremony of the "National Atomic Level Manufacturing Unveiling and Leading Project" was held at the Xincheng Lijing Hotel in Jiangbei New District, Nanjing, with Nanjing Yuanlei Nanomaterials Co., Ltd. as the unveiling unit. This project aims to break through the bottleneck of key equipment and processes in integrated circuit manufacturing, targeting the international technological frontier of atomic level manufacturing. It has significant strategic significance for China to seize the future industrial high ground and ensure the security of the industrial chain. More than a hundred leaders, experts, scholars, and partners from the Provincial Department of Industry and Information Technology, Jiangbei New Area Government, universities, industrial and investment sectors gathered together to witness this milestone moment.
Mr. Zheng Jin, Chairman of Nanjing Yuanlei Nanomaterials Co., Ltd., delivered the opening speech first. He stated that since its establishment in 2018, the company has been deeply engaged in the field of atomic level manufacturing, committed to the research and development of core technologies such as atomic layer deposition, etching, and silicon germanium epitaxy, and equipment manufacturing. With the concept of "striving for excellence and achieving win-win results", the company promotes industrial innovation. The company promises to pursue atomic level precision with a rigorous attitude, be brave in technological breakthroughs, and actively work together with all parties to build an innovative ecosystem. Yuanlei Nano will live up to its mission, work together with partners to accelerate the industrialization of technology, and contribute to the country's self-reliance and self-improvement in science and technology.
Mr. Cao Xufeng, Deputy Director of the Economic Development Bureau of Jiangbei New District, Nanjing, delivered a speech on behalf of the local government. He pointed out that as a national level new area and innovation source, Jiangbei New Area has always been committed to building a first-class integrated circuit industry ecosystem. Currently, it has formed a complete chain of design leadership, manufacturing packaging and testing, and coordinated development of materials and equipment. The "Research on Atomic Layer Deposition Technology for Atomic Level Alignment" project unveiled by Nanjing Yuanlei Nano has landed, which is highly in line with the development direction of the integrated circuit industry. The new area will make every effort to provide service guarantees and support teams to venture into the "no man's land". We look forward to the project breaking through core technologies as soon as possible and injecting new momentum into enhancing the competitiveness of the national integrated circuit industry.
In the subsequent keynote speech, three experts and scholars elaborated on the project theme from three dimensions: technology, cooperation, and industry. Firstly, Dr. Shi Qiuwei, the core technology leader of the project and the R&D director of Nanjing Yuanlei Technology, presented a project launch report titled "Research on Atomic Layer Deposition Technology for Atomic Level Alignment", detailing the technical objectives, research roadmap, and expected results of the project. Subsequently, Professor Ling Haifeng, Vice Dean of the School of Materials Science and Technology at Nanjing University of Posts and Telecommunications, stated that as a participating unit in the "unveiling and leading" project, Nanjing University of Posts and Telecommunications will focus on the innovative application of atomic layer deposition technology in flexible electronic devices, effectively demonstrating the solid foundation of deep integration and collaborative innovation between industry, academia, and research. Finally, Professor Shi Longxing, Chief Professor of Southeast University and Chairman of Jiangsu Integrated Circuit Society, gave a summary sharing from the macro perspective of the industry, deeply analyzing the decisive significance of atomic level manufacturing for the development of next-generation integrated circuits, and pointing out clear industrial application
prospects or the project.
At around 11 am, the ceremony reached its climax - the unveiling ceremony. Amidst the passionate music and countdown, Mr. Zheng Jin, Chairman of Nanjing Yuanlei Nanomaterials Co., Ltd., Mr. Cao Xufeng, Deputy Director of the Economic Development Bureau of Jiangbei New Area in Nanjing, Dr. Xie Dong from Hubei Jiangcheng Laboratory, and Professor Fan Quli, Dean of the School of Materials Science and Technology at Nanjing University of Posts and Telecommunications, jointly took the stage to unveil the "Hero List" symbolizing national mission and technological future. The high unveiling of the Golden List marks the official launch of this national level major research and development project, setting sail.
In order to ensure the progressiveness and feasibility of the technical route of the project, a high-level expert advisory group was also established at the ceremony. Mr. Zheng Jin, Chairman of Nanjing Yuanlei, presented appointment letters to the first batch of hired experts, including Professor Shi Longxing from Southeast University, Professor Ding Shijin from Fudan University, Professor Wang Wei from Peking University, Professor Ding Sun'an from Nanjing University, Professor He Longbing from Southeast University, and Professor Zeng Jinwei from Huazhong University of Science and Technology. The support of top think tanks will provide strong technical support for the smooth implementation of the "unveiling and leading" project.

The ceremony ended successfully in a grand and enthusiastic atmosphere. The launch of the "National Atomic Level Manufacturing Unveiling and Leading Project" is a vivid practice of implementing the new national system for tackling key core technologies, effectively integrating the multiple forces of enterprise entities, university research and development, and government support. The implementation of the project is expected to form an independent intellectual property system in the field of atomic level precision manufacturing, break the monopoly of foreign technology, and lay a solid foundation for the upgrading and breakthrough of China's integrated circuit industry and even the entire high-end manufacturing industry.