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TiNA TM series

Product Highlights
  • Adopting a self-developed platform transmission system it can accommodate up to 6 chambers
  • High quality cavity material
  • Unique power components that can meet the loading of 3 wafers
  • Can achieve rapid hot annealing process at 600 ℃
  • Configure pre-processing and self-cleaning functions for the cavity
Specifications
  • Process Type 12 inches
    Film installation ability 3 pieces/cavity can be configured with 2-6 process cavities
    腔体材质 316L stainless steel material optional ceramic coating
    Applicable process Ru、Cu、Co、W
    Application Advanced process logic storage 3D NAND and other fields below 28nm

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