Product Highlights

• Integrate 8-10 process chambers

• The independently developed VTM transmission system is equipped with two cooling stations to simultaneously cool 5 wafers

• Configure 2loadlocks (25pcs/loadlocks) with built-in self-cleaning function to ensure wafer cleanliness

• The low background pressure of the process chamber greatly controls the oxygen content of the nitride film layer

• Unique plasma treatment technology can effectively reduce the impact of high-energy particles on local film layers

• Unique process chamber design ensures good temperature and flow field damage

• Convenient maintenance with built-in lifting system greatly reduces system assembly inspection and maintenance time

Download Materials