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 A B O U T U S 

Atomic Nano-Materials and Equipment Co, Ltd. (ANAME) was established in September 2018 by a professional team with nearly 20 years of experience in semiconductor equipment and process research and development. ANAME is commited to becoming a high-end semiconductor thin film deposition equipment manufacturer. The products include atomic layer deposition (ALD) equipment and silicon-germanium epitaxy (EPl) equipment, which are widely applicable in 2.5D and 3D advanced packaging, compound semiconductors, and advanced logic and memory processes below 28nm. Aname has obtained numerous honors such as high-tech enterprises, Nanjing unicorn cultivation enterprises, Jiangsu Province Specialized, Refined, Unique and New Small and Medium sized Enterprises. 

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High vacuum fast and slow double speed valve
Yuanhe Semiconductor has independent intellectual property rights of high vacuum fast and slow double speed valve. High vacuum fast and slow double speed valve is a special type of vacuum valve, mainly used in vacuum systems, to change the direction of air flow and adjust the size of air flow, with two fast and slow modes of operation. It could be customized according to actual needs. Its flexible adaptation to different vacuum processes plays an important role in the field of vacuum technology due to its unique functions and wide range of applications.
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P R O D U C T S

 

Main business: design, manufacture and sales of atomic layer deposition (ALD) and silicon germanium epitaxy (EPI) equipment, equipment and process solutions, equipment customization services, and material optoelectronic characterization services. With a professional team and technological innovation, we are committed to providing customers with comprehensive and one-stop solutions, helping them achieve efficient production and quality improvement.

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SEMICON China 2025 Concludes Successfully: Nanjing Yuanlei Nanomaterials Showcases Innovation Strength of Domestic Semiconductor Equipment
The global semiconductor industry event SEMICON China 2025 was successfully held from March 26 to 28 at the Shanghai New International Expo Center. This year's exhibition brought together top global experts, industry leaders, and innovative enterprises to explore the latest trends in semiconductor technology. As an outstanding representative in the field of domestic semiconductor equipment, Nanjing Yuanlei Nanomaterials Co., Ltd. (hereinafter referred to as "Yuanlei Nano") showcased its leading atomic layer deposition (ALD) and silicon-germanium (SiGe) epitaxy equipment, demonstrating China's groundbreaking achievements in high-end semiconductor deposition equipment, processes, and integrated material solutions.
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The First Forum on Semiconductor Parts Precision Machining and Surface Treatment Technology
The First Forum on Semiconductor Parts Precision Machining and Surface Treatment Technology was held in Tongling City on 20th Oct, which was jointly organized by Tongling Yuanhe Semiconductor Technology Co., Ltd. and the Tongling Economic and Technological Development Zone Management Committee.
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Tongling Yuanhe Semiconductor Technology Co., Ltd. Opening Ceremony
On October 21st, ANAME has completed another major milestone - the official opening of Tongling Yuanhe Semiconductor Technology Corporation. This marks ANAME’s another solid step in the semiconductor industry.
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C O N T A C T

Telephone: +025-58277112
Sales Telephone: Manager Zhang 13815424556

Manager Hu 13916235350
Customer Service Tel: 15850767261
Address: 21st, 22nd and 25th Floors, Building B, Qingyun Building, No. 266, Puyun Road, Jiangbei New District, Nanjing
Email: 
sales@aname-nj.com

 

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